Téléchargez le livre : High Density Plasma Sources

High Density Plasma Sources

Design, Physics and Performance

de

Éditeur :

William Andrew


Paru le : 1996-12-31



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Description
This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing. The book is a balanced presentation in that it gives both a theoretical treatment and practical applications. It should be of considerable interest to scientists and engineers working on plasma source design, and process development.
Pages
465 pages
Collection
n.c
Parution
1996-12-31
Marque
William Andrew
EAN papier
9780815513773
EAN EPUB SANS DRM
9780815517894
Informations sur l'ebook
Ce livre est accessible aux handicaps Voir les informations sur l'accessibilité
Prix
163,52 €

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